Low-Ohmic Resistance Comparison: Measurement Capabilities and Resistor Travelling Behavior

Gert Rietveld, Jan H. N. van der Beek, Marlin Kraft, Randolph Elmquist, Alessandro Mortara, and Beat Jeckelmann, “Low-Ohmic Resistance Comparison: Measurement Capabilities and Resistor Travelling Behavior”, IEEE Transactions on Instrumentation and Measurement 62, 1723 – 1728 (2013).

Abstract:
The low-ohmic resistance measurement capabilities of the Van Swinden Laboratorium, National Institute of Standards and Technology, and the Federal Office of Metrology (METAS) were compared using a set of resistors with values 100 mΩ, 10 mΩ,1mΩ, and 100 μΩ, respectively. The measurement results of the three laboratories agree extremely well within the respective measurement uncertainties with the comparison reference value. Careful transport of the resistors was crucial for achieving this result. Still, some of the resistors showed steps in value at each transport which likely relates to the construction of the resistance elements of these resistors.

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For more information contact grietveld@vsl.nl or jvdbeek@vsl.nl