Evaluation of Low-Ohmic Resistance Measurement Capabilities between VSL and NIST

Gert Rietveld, Jan van der Beek, and Marlin Kraft: “Evaluation of Low-Ohmic Resistance Measurement Capabilities between VSL and NIST”,
Submitted for publication in the Proceedings of the 2012 Conference on Precision Electromagnetic Measurements, Washington, US (2012).

Abstract:
The low-ohmic resistance measurement capabilities of the Van Swinden Laboratorium (VSL) and the National Institute of Standards and Technology (NIST) were compared using a set of resistors with values 100 mΩ, 10 mΩ, 1 mΩ, and 100 μΩ respectively. The measurement data of both laboratories generally agree well within the combined measurement uncertainties, ranging from 0.54 μΩ/Ω at 100 mΩ to 4.3 μΩ/Ω at 100 μΩ (k = 2). Careful transport of the resistors was crucial for achieving this result.

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For more information contact Gert Rietveld, grietveld@vsl.nl